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David B. Wittry - Articles
PUBLICATIONS (*Denotes invited papers)
1. "An Electron Probe for Local Analysis by Means of X-Rays," Thesis, California Institute of Technology, I957, and Interim Technical Report No. 5. under Contract DA-94-495-ORD-463.
2. "Two Improvements in Electron Sources for Electron Probes," Rev. Sci. Instrum. 28_, p. 58(1957).
3. "Resolution of Electron Probe Microanalyzers," J. Appl. Phys. 29_, pp. 1543-1548 (1958).
4. "Instrumentation for Electron Probe Microanalysis," Advances in X-Ray Analysis. Vol. 3, Plenum Press, pp. 185-195 (I960).
5. "Metallurgical Applications of the Electron Probe Microanalyzer," Advances in X-Rav Analysis. Vol. 3, Plenum Press, pp. 197-212 (I960).
6. "Use of the Electron Probe X-Ray Microanalyzer in the Study of Semiconductor Alloys," with J. O. McCaldin and J. M. Axelrod, Properties of Elemental and Compound Semiconductors. Interscience Publishers, New York, pp. 89-100 (I960).
7. "Germanium Saturated with Gallium Antimonide," with J. O. McCaldin, J. Appl. Phys. 32, pp. 65-69 (1961).
8. "Determination of Surface Composition of the Moon from a Lunar Satellite," with G. Arrhenius and L H. Cohen, Geofisica International. I, No. 4, pp. 95-106 (1961).
9. "Equipment for Beam Scanning and Step Scanning in Electron Probe Analysis," with R. W. Fitzgerald, Advances in X-Rav Analysis Vol. 5, Plenum Press, pp. 538-553 (1962).
10. "Micrometallurgy," Metals Engineering Quarterly_2, No. 3, pp. 47-57 (I962).
11. "Fluorescence of K Lines by K Lines in Electron Probe Microanalysis," USCEC Report pp. 84-204.
12. "X-Ray Microanalysis by Means of Electron Probes," Treatise on Analytical Chemistry. Part I, Vol. 5, Interscience Publishers, New York, pp. 3I73-3232 (I964).
*13. "Methods of Quantitative Electron Probe Analysis," Symposium on X-Ray and Electron Probe Analysis, STP 349, American Society for Testing and Materials, Philadelphia, PA (I964). Also in Advances in X-Ray Analysis. Vol. 7, Plenum Press, pp. 395-4I8 (I964).
14. "A Comparison of the Performance of Gratings and Crystals in the 20-II5A Region," with J. B. Nicholson, Advances in
X-Rav Analysis. Vol. 7, Plenum Press DD 497-5II (I964).15. "Use of Electron Probes in the Study of Recombination Radiation " with D F Kvser J. Appl. Phys. 25, pp. 2439-2442 (I964). David B. Wittrv
16. "Cathodoluminescence in GaAs," with D. F. Kyser, The Electron Microprobe. John Wiley and Sons, Inc., New York, pp. 69I-7I4 (I966).
17. "Cathodoluminescence at p-n Junctions in GaAs," with D. F. Kyser, J. Appl. Phys. 3§, pp. I387-I389 (I965).
18. "Temperature-Controlled Stage for Electron Probe Microanalyzers," with E. L. Miller, Rev. Sci. lnstrum._37, pp. II5-II6 (I966).
*19. "Secondary Electron Emission in the Electron Probe," Optique des Ravons X et Microanalyse. ed. by R. Castaing, et al., Hermann, Paris, pp. I68-I80 (I966).
20. "Cathodoluminescence and Impurity Variations in Te-Doped GaAs," Appl. Phys. Lett. 8., p. I42 (I966).
21. The Electron Microprobe. ed. by T. D. McKinley, D.F.J. Heinrich, and D. B. Wittry, John Wiley and Sons, Inc., New York (I966).
22. "Electron Beam Interactions in Semiconductors,11Electron Microscopy, ed. by Uyeda, Maruzen Co., Ltd., Tokyo, p. 607 (1966).
23. "Surface Recombination Velocities and Diffusion Lengths in GaAs," with D. F. Kyser, Proceedings of the International Conference on the Phvsics of Semiconductors. Kyoto, J. Phys. Soc. Japan21, Supplement, pp. 312-316 (1966).
24. "Measurement of Diffusion Lengths in Direct-Gap Semiconductors with Electron Beam Excitation," with D. F. Kyser, J. Appl. Phys._3_8, pp. 375-382 (1967).
25. "Mechanisms for Contrast Formation in High Voltage Microscopy," Proceedings of the AMU-ANL Workshop on High Voltage Electron Microscopy. Rept. No. ANL 7275, pp. 79-84 (1966).
26. "A Steroscopic Display System for Electron Microprobe Instruments," with A. VanCouvering, J. of Sci. Instrum., G. B.,.44, pp. 294-295 (1967).
27. "Spatial Distribution of Excess Garners in Electron-Beam Excited Semiconductors," with D. F. Kyser, Proc. of the IEEE_5_5, pp. 733-734 (1967).
28. "Some Optical Signal Detection Techniques for Electron Microprobe Instruments," with D. F. Kyser and J. McCoy, Second National Conf. on Electron Microprobe Analysis, Boston, MA, June pp. 14-16,1967.
29. "An Evaluation of Absorption Correction Functions for Electron Probe Microanalysis," with C. A. Andersen. Brit. J. Appl. Phys.. Sec. 2, Vol. I, pp. 529-540 (1968).
30. "Electron Beam Modulated Reflectance of Germanium," with J. H. McCoy, Appl. Phys. Lett. J3, p. 272 (1968).
31. "Microanalysis in the Transmission Electron Microscope by Selected Area Electron Spectrometry," with R. P. Ferrier and V. E. Cosslett, 5th International Congress on X-Ray Optics and Microanalysis, Tubingen, I968 (Springer-Verlag, I969), pp 293-298. David B. Wittrv
*32. "Recent Advances in Instrumentation for Electron Probe Microanalysis," 5th International Congress on X-Ray Optics and Microanalysis, Tubingen, 1968 (Springer-Verlag, 1969) pp. 206-218.
33. "Prediction of X-Ray Production and Electron Scattering in Electron Probe Analysis Using a Transport Equation," with D. B. Brown and D. F. Kyser, J. Appl. Phys. 4Q, pp. 1627-1636 (1969).
34. "Measurement of Diffusion Lengths in p-type Gallium Arsenide by Electron Beam Excitation," with T. S. Rao-Sahib, J. Appl. Phys._40, pp. 3745-3750 (1969).
35 "An Electron Spectrometer for Use with the Transmission Electron Microscope," Brit. J. Appl. Phys. (J. Phys. D.) Ser. 2, 2, pp. 1757-1766 (1969).
36. "Selected Area Electron Spectrometry in the Transmission Electron Microscope," with R. P. Ferrier and V. E. Cosslett, Brit. J. Appl. Phys. (J. Phys. D.), Ser. 2, g, pp. 1767-1776.
37. "Measurement of the X-Ray Continuum from Thick Targets," with T. S. Rao-Sahib, Proc. Fourth National Conference on Electron Microprobe Analysis. Paper No. 2 (1969).
*38. "Electron Beam Interactions in Solids," Proc. Third Annual Scanning Electron Microscope Symposium. IIT Research Institute, Chicago, IL, pp. 409-416 (April I970).
39. "A Scanning Electron Microscope with Efficient Detection of Reflected or Emitted Charged Particles," with P. A. Sullivan, Proc. Seventh International Congress on Electron Microscopy. Grenoble, France, Vol. I, pp. 205-206 (I970).
40. "An Electron Spectrometer for Use with the Hitachi HU-I25," with R. E. Gauldin, Proc. Seventh International Congress on Electron Microscopy. Grenoble, France, Vol. I, pp. 157-58 (I970).
41. "Electron Beam Modulated Optical Properties of Semiconductors," with J. H. McCoy, J. Appl. Phys. 42, pp. II74-II8I (I97I).
42. "A Clean Vacuum Electron Beam Column for Cathodoluminescence Investigations", with H. G. Marciniak, Rev. Sci. lnstrum._42, pp. I8II-I8I3 (I97I).
43. "Crystallographic Information from Scanning Electron Microscope Images," Proc. 6th International Conference on X-rav Optics and Microanalysis. Osaka, Japan, I97I (U. of Tokyo Press, I972) pp. 47I-475.
*44. Techniques for Semiconductor Research with Electron Beam Instruments," Proc. 6th International Conference on X-rav Optics and Microanalysis), Osaka, Japan, I97I (U. of Tokyo Press, I972) pp. 23I-238.
45. "The X-Ray Continuum from Thick Targets," with T. S. Rao-Sahib, Proc. 6th International Conference on X-rav Optics and Microanalysis. Osaka, Japan, I97I (U. of Tokyo Press, I972) pp. I3I-I37. David B. Wittry
46. "An Electron Spectrometer for Quantitative Measurements of Surface Voltages with Electron Microprobe Instruments," with K. Y. Chiu, Proc. Seventh National Conference on Electron Probe Analysis). San Francisco, 1972, paper No. 14.
47. "Temperature Dependence of Cathodoluminescence of GaAs, GaP, and GaAsxP,. x>" with H. C. Marciniak, Proc. Seventh National Conference on Electron Probe Analysis). San Francisco. 1972. Paper No. 27.
48. "Modification of the High Voltage Supply of an Electron Microscope for Improved Stability," with R. E. Gauldin, 30th Ann. Proc. Electron Microscopy Soc. Amer.. Los Angeles, CA1972, C. J. Arcencaux, ed., p. 470.
49. "Infrared Modulation of Cathodoluminescence," with W. N. Lin, Bull. Am. Phys. Soc., Ser. II, Vol. JZ, p. 1194(1972).
50. "Applications of Electron Microprobes to Solid-State Electronics," in Microprobe Analysis, ed. by C. A. Andersen (John Wiley and Sons, Inc., New York, 1973).
51. "Cathodoluminescence Study of Deformed Regions in n-type GaAs," with A. L Esquivel and W. N. Lin, Appl. Phys. Letters, April 15,1973.
52. "Study of a Duoplasmatron with a Quadrupole Mass Spectrometer," with J. C. Potosky, Proc. 8th National Conference on Electron Probe Analysis. New Orleans, I973.
53. "Study of GaAs Using Infrared Modulation of Cathodoluminescence," with W. N. Lin, Proc. 8th National Conference on Electron Probe Analysis. New Orleans, I973.
54. "X-Ray Continuum from Thick Elemental Targets for 10-50 keV Electrons," with T. S. Rao-Sahib, J. Appl. Phys. 45., pp. 5060-5068 (I974).
*55. "Some Investigations Concerning Research in Solid State Electronics with Electron Microprobes," Proc. 7th International Conference on X-Ray Optics and Microanalvsis. Moscow-Kiev, I974.
56. "The Charging of Semi-Insulating Specimens in Electron Microprobe Instruments," with C. J. Wu, Proc. 8th Ann. Scanning Electron Microscope Symposium. IIT Research Institute, pp. 44I-445 (I975).
57. "Propagation of Residual Dislocations During Silicon Epitaxy," with H. Koyama and T. Kato, J. Appl. Phys.j46, pp. 2899- 2902 (I975).
58. "A Quadrupole Instrument for Investigation of Electron and Ion Beam Interactions with Solids," with J. C. Potosky, Proc. IQth National Conf. on Electron Probe Analysis. Las Vegas. I975.
59. "Measurement of Surface Voltages Using the Voltage Dependence of X-Ray Intensities," with C. J. Wu, Proc. IQth National Conf. on Electron Probe Analysis. Las Vegas, I975.
60. "Theoretical Performance of Blazed Gratings at Grazing Incidence," with K. Tsutsumi, Proc. IQth National Conf. on Electron Probe Analysis. Las Vegas, I975. David B. Wittrv
61. "Cathodoluminescence of GaAsxP|.x Alloys," with H. Marciniak, J. Appl. Phys. 46, pp. 4823-4828 (I975).
62. "Effect of Blaze Angle on the Efficiency of Grazing Incidence Spectrometers," with K. Tsutsumi, Japan J. Appl. Phys. J4, pp. I79I-I797 (I975).
63. "Investigation of Semi-Insulating GaAs Using Infrared Modulated Cathodoluminescence and Specimen Current," with W. N. Lin, J. Appl. Phys., 47, pp. 4I29-4I36 (I976).
*64. "Microanalysis, Past, Present, Future," Proc. Advanced Techniques in Failure Analysis Symposium -1975. IEEE Cat. No. 76CHI092-6REG6.
65. "Investigation of Deep Levels in ZnSe Using Electron and Photon Excitation," with C. J. Wu, Proc. llth Nat. Conference Microbeam Analysis Soc.. Miami Beach, I976.
*66. "Present and Future Possibilities of Local Chemical Analysis Based Physical Techniques." Proc. llth Nat. Conf. Microbeam Analysis Soc.. Miami Beach, I976.
67. "Use of Coincidence Techniques to Improve the Detection Limits of Electron Spectroscopy in STEM", Ultramicroscopy.l, pp. 297-300 (I976).
68. "Measurement of Diffusion Lengths of Excess Carriers in Semiconductors by the Voltage Dependence of Electron Beam Induced Currents at Schottky Barriers, with C. J. Wu, Proc. 8th International Conf. on X-Rav Optics and Microanalysis. Boston, I977.
69. "Critical Problems in Quantitative Secondary Ion Mass Spectroscopy," Proc. 8th International Conf. on X-Rav Optics and X-Rav Microanalysis. Boston, I977, D. R. Beaman, R. E. Ogilvie and D. B. Wittry, eds., Pendall Pub. Co., Midland, Michigan, I980.
70. "Investigation of Minority Carrier Diffusion Lengths by Electron Bombardment of Schottky Barriers," with C. J. Wu, J. Appl. Phys._19, pp. 2827-2836 (I978).
71. "Optimization of Recording Secondary Ion Mass Spectra," Proc. I3th Annual Conf..
Microbeam Analysis Society. Ann Arbor. Michigan. I978.,72. "Use of Specimen Current Integration in SIMS," with F. Quo, Proc. I3th Annual Conf.. Microbeam Analysis Society. Ann Arbor, Michigan, I978.
73. "Energy Distribution of Positive Ions Sputtered from III-V Compounds," with T. A. Whatley, Proc. I3th Annual Conf.. Microbeam Analysis Society. Ann Arbor, Michigan
74. "The Secondary Ion Optics of a Quadrupole Ion Microprobe," with J. C. Potosky, Proc. I3th Annual Conf.. Microbeam Analysis Society, Ann Arbor, Michigan, I978.
75. "A Preliminary Evaluation of Extraction Geometries Used in Secondary Ion Mass Spectrometry," with S. Y. Yin and R. A. Wittry, Report on Second Japan-U.S. Seminar on SIMS--Secondary Ion Mass Spectroscopy: Fundamentals and Applications, Takarazuka, Japan, pp. 2II-2I3 (I978). David B. Wittrv
*76. "Local Characterization of Solids by Electron Energy Loss Spectrometry," J. Microscopy H7, pp. 175-184 (1979).
77. "Adaptation of the Dietz Detector to an ARL Ion Microprobe Mass Analyzer," with F. Quo. Microbeam Analysis) -1979. D. E. Newbury, ed., San Francisco Press pp. 341-342(1979).
78. "Secondary Ion Mass Spectrometry Using Selected Primary Ions and Variation of the Partial Pressure of Selected Gases in the Specimen Region," with F. Quo, Microbeam Analysis) -1979. D. E. Newbury, ed., San Francisco Press, pp. 334 (I979).
79. "Digital Mass Control for an Ion Microprobe Mass Analyzer," with F. Quo, Secondary Ion Mass Spectrometrv SIMS II. ed. by A. Benninghoven, C. A. Evans, Jr., R. A. Powell, R. Shimizu and H. A. Storms, Springer-Verlag, p. I99 (I979).
80. "Novel 'Heat Pipe1 Rotating Anode for X-Ray Lithography," with R. S. Messinger, T. S. Rao-Sahib, A. B. Jones and J. P. Reekstin, Vacuum Sci. and Tech. ]£, pp. 1946-1948 (1979).
*81. "Spectroscopy in Microscopy and Microanalysis: The Search for an Ultimate Analytical Technique," Proc. of the 9th International Conference on X-Rav Optics and Microanalysis. The Hague, Aug. 25-29,1980.
82. "An X-Ray Spectrometer Data Acquisition System Using a Microprocessor Based Computer," with R. S. Lisiecki, Microbeam Analysis^ - I98Q. D. B. Wittry, ed., San Francisco Press, p. 89 (I980).
83. "Design Considerations for a Scanning Electron Microscope and Particle Analyzer (SEMPA) for a Comet Rendezvous Mission," with A. L Albee et al., I5th Annual Conference of the Microbeam Analysis Society, Reno, Aug. 4-8, I960 (post- deadline paper).
84. "Cathodoluminescence Study of the Anodic Oxides on GaAs" with S. Y. Yin, I5th Annual Conference of Microbeam Analysis Society, Reno, Aug. 4-8, I960. Late breaking developments session.;
85. "Prospects for Room Temperature Solid State Detectors in Electron Probe Microanalysis," Microbeam Analysis - I98I. R. H. Geiss, ed., San Francisco Press, pp. 339-34! (I98I).
86. "A Simplified Hybrid Detector for Ion Counting," with F. Guo, J. Phys E- Sci lnstrumen.15, pp. 834-838 (1982).
87. "Use of Cathodoluminescence and SIMS in the Study of Thermal Conversion of GaAs" with S. Y. Yin, Microbeam Analysis -1982. K.F.J. Heinrich, ed., San Francisco Press, pp. 413-414 (1982).
88. "Study of the Thermal Conversion of Semi-Insulating GaAs:Cr with Cathodoluminescence, Photoluminescence and Secondary Ion Mass Spectrometry," with S. Y. Yin, J. Appl. Phys.Jj4, pp. 360-365 (1983). David B. Wittrv
*89. "Gaussian Models for the Energy Distribution of Excitation in Solids: Applications to Solid State Electronics," in Electron Beam Interactions in Solids. Scanning Electron Microsopy, Inc. AMF O'Hare, IL 60666, pp. 99-108 (1984).
*90. "Studies of Semiconductors with Electron and Ion Beams," lOth International Conference on X-ray Optics and Microanalysis, J. de Physique. 45. Colloque C2, sup, no. 2, C2-855-860 (1984).
91 "X-Ray Ruorescence Analysis with Monochromatic X-Rays", with M. Kotera, lOth International Conference on X-Ray Optics and Microanalysis, J. de Physicque 4J>, Colloque C2, Sup. no. 2, C2-28I-284 (I984).
92 "Parameters Influencing Ion Intensities for Quadrupole SIMS Instruments" with M. Kotera, Secondary Ion Mass Spectrometry SIMS IV. Springer-Verlaa.pp. ISO-152 (1984).
93 "Investigation of Gas Phase Ions with a Quadrupole SIMS Instrument," with M. Kotera, Secondary Ion Mass Spectrometrv SIMS IV. Springer-Verlag, pp. 336-339 (1984).
94 "Parallax Stereograms Obtained by Using the Nimslo Process," 42nd Ann. Proc. Electron Microscopy Soc. Amer.. San Francisco, CA, G. W. Bailey, ed., p. 726 (1984).
95. "Analysis of the Short Circuit Current of a Polycrystalline Solar Cell with Excitation b y a Gated Electron Beam," with A. Romanowski and J. M. Tsaur; J. Appl. Phys. 5J), p. 951-7 (1985).
*96. "Microanalytical Techniques: Recent Developments and Future Prospects," Proc. Rrst Beijing Conference on Instrumental Analysis, Beijing, China, Nov. 18-22, 1985 (in press).
97. "Measurement of Carrier Lifetime, Effective Recombination Velocity and Diffusion Length Near the Grain Boundary using the Time Dependent EBIC Method," with A. Romanowski; J. Appl. Phys._6D, pp. 2910-2913 (1986).
*98 "Electron Beam Techniques for Studying Electronic Materials and Devices," Microbeam Analysis! - 1986. A. D. Romig, Jr. and W. F. Chambers, Eds., San Francisco Press, pp. 625-630(1986).
99. "An Electromagnetic/Electrostatic Dual Cathode System for Electron Beam Instruments," with J. G. Bradley, J. M. Conley and A. L. Albee; Microbeam Analysis -1986. A. D. Romig, Jr. and W. F. Chambers, Eds., San Francisco Press, pp. 265-267 (1986).
100. "X-Ray Microprobes--A Comparison of Laboratory Sources and Synchrotron Sources," with D. M. Golijanin, Proc. 11th Intl. Conf. X-Ray Optics and Microanalvsis. IXCOM-11, U. Western Ontario Graphics Services, London, Ontario, Canada, NGA, 5B9, pp. 51-55 (1986).
101. "Development of an X-Ray Microprobe for Local X-Ray Spectrochemical Analysis," with D.M. Golijanin, Microbean Analysis--1987. Roy H. Geiss, Ed., San Francisco Press, pp. 54-56(1987). David B. Wittrv
102. "Alignment and Characterization of Doubly-Curved X-Ray Diffractors," with D.M. Golijanin. Microbeam Analvsis-1987. Roy H. Geiss, Ed., San Francisco Press, pp. 51-55(1987).
103. "Large Aperture Point Focussing X-Ray Diffractor for X-Rays," with P.M. Golijanin, Applied Physics Letters_52, pp. 1381-1382 (1988).
*104. "Microprobe X-Ray Fluorescence: New Developments in an Old Technique," with D. M. Golijanin, D. E. Newbury, Ed., Microbeam Analysis - 1988.San Francisco Press, pp. 397-402 (1988).
105. "Detection Limits in Microprobe X-Ray Ruorescence Analysis," with D. M. Golijanin, Microbeam Analysis - 1988. D. E. Newbury, Ed., San Francisco Press, pp. 394-396 (1988).
106. "Determination of Grain Boundary Parameters of Polycrystalline Silicon by ac Electron- Beam-induced-current, with A. Romanowski, J. Appl. Phys. £4, pp. 4601-4608 (1988).
*107. "Further Developments in Instrumentation for Microprobe X-Ray Ruorescence Analysis," with D.M. Golijanin and S. Sun, Microbeam Analvsis-1989. P. E. Russell, Ed., San Francisco Press, pp. 125-126 (1989).
108. "Comparison of Damage Produced by Photon and Electron Excitation," with D. M. Golijanin and S. Sun, Microbeam Analvsis-1989. P. E. Russell, Ed., San Francisco Press, pp. 186-190 (1989).
*109. "X-Ray Microprobes Based on Doubly Curved Crystals," with D. M. Golijanin and; S. Sun, Proc. 12th International Conference on X-Ray Optics and Microanalysis, 1989, Cracow 12 ICXOM vol. 1, S. Jasienska and LJ. Maksymowicz, eds, Academy of Mining and Metallurgy Printing House, Crakow, Poland, pp. 31-36 (1990).
*1 1 0. "Recent Research on Semiconductors Using Electron Beam Induced Current," Proc. 12th International Conference on X-Ray Optics and Microanalysis, 1989, Cracow 1 2 ICXQM vol. 2, S. Jasienska and LJ. Maksymowicz, eds, Academy of Mining and Metallurgy Printing House, Crakow, Poland, pp. 867-871 (1990).
111. "A simulation of SE and BSE Images in SEM at a Surface Topography," with M. Kotera, T. Kishida, T. Fujiwara, and H. Suga, Proc. 12th International Conference on X-Ray Optics and Microanalysis, 1989. Cracow 12 ICXQM vol. 1, S. Jasienska and LJ. Maksymowicz, eds, Academy of Mining and Metallurgy Printing House, Crakow, Poland, pp. 231-236 (1990).
112. "X-Ray Optics of Doubly Curved Diffractors," with S. Sun, J. Appl. Phys. gZ, pp. 1633-1638 (1990).
1 1 3. "Focussing Properties of Curved X-Ray Diffractors," with S. Sun, J. Appl. Phys. 68, pp. 387-391 (1990).David B. Wittrv
114. "High Efficiency X-Ray Monochromator for Measurement of Ca in TEM," with J. McD. Tormey and S. Sun, Proc. Xllth International Congress for Electron Microscopy, vol. 2, San Francisco Press, 1990, p156-7. Extended paper h Microbeam Analvsis-1990. San Francisco, pp. 415-418 (1990).
115. "Stepped Diffractor for Point Focussing of Monochromatic X-Rays," with Q. Sun, Proc. Xllth International Congress for Electron Microscopy, San Francisco Press, 1990, pp. 114-115. Extended paper in Microbeam Analvsis-1990. San Francisco Press, San Francisco, pp. 69-72 (1990).
116. "A Simulation of Topographic Contrast in the SEM," with M. Kotera, T. Fujiwara, and H. Suga, Jpn. J. Appl. Phys._29, pp. 2312-2316 (1990).
117. "A Simulation of Electron Scattering in Metals," with M. Kotera, R. Ijichi, T. Fujiwara, and H. Suga, Jpn. J. Appl. Phys._29, pp. 2277-2282 (1990).
118. "Properties of Curved X-Ray Diffractors with Stepped Surfaces," with S. Sun, J. Appl. Phys. £9., pp. 3886-3892 (1991).
119. "Angle-Sensitive X-Ray Topographs Obtained with Kossel Lines," with Songquan Sun and W.Z. Chang, J. Appl. Crystal_24, pp. 999-1004 (1991).
120. "Micro-power Seemann-Bohlin Diffractometer for Crystallographic Identification of Minerals," with S. Sun and J.G. Bradley, Microbeam Analysis -1991. D.G. Howitt, Ed., San Francisco Press, San Francisco, CA, pp. 299-303 (1991).
121. "Evaluation of Crystal Diffractor Parameters Using a Microfocus X-Ray Source," with W.Z. Chang, Microbeam Analysis -1991. San Francisco Press, D.G. Howitt, Ed., San Francisco, CA, pp. 322-326 (1991).
122. "X-Ray Optics of Doubly Curved Diffractors - II," with S. Sun, J. Appl. Phys. Zl, pp. 564-8 (1992).
123. "Evaluation of Crystal Diffractor Parameters for Curved Crystals," with W.Z. Chang, first published in J. Appl. Phys.J72, 3440 (1992) with errors in publication; corrected version: J. Appl. Phys. .73, pp. 601-607 (1993).
124. "X-ray Diffraction Properties of Curved Crystal Diffractors," with W.Z. Chang, Proc. of EMSA 50th Annual Meeting, MAS 27th Annual Meeting, and MSC/SMC 19th Annual Meeting 1992, G.W. Bailey, J. Bentley, and J.A. Small Eds. (San Francisco Press, San Francisco, CA, 94142-6800), Part II, pp. 1732-1733.
125. "Use of Oriented Polycrystalline Rims in X-ray Optics," with W.Z. Chang and T.W. Barbee, Proc. of EMSA 50th Annual Meeting, MAS 27th Annual Meeting, and MSC/SMC 19th Annual Meeting 1992, Ibid, pp. 1734-1735.
*126. "Focussing X-rays for Microprobe X-ray Fluorescence Analysis," Proc. of EMSA 50th Annual Meeting, MAS 27th Annual Meeting, and MSC/SMC 19th Annual Meeting 1992, Ibid, pp. 1730-1731.
*127. "Early History of the Microbeam Analysis Society," Microbeam Analysis, 1, pp. 1 -2 (1992). David B. Wittrv
128. "New Doubly Curved Diffractor Geometries and Their Use in Microanalysis," X-Ray Optics and Microanalvsis 1992: Proc. of 13th ICXOM. X-Ray Optics and Microanalysis 1992: Proc. of 13th ICXOM, pp. 535-538, (Inst. of Physics Pub., Bristol, 1993).
129. "Properties of Fixed-position Bragg Diffractors for Parallel Detection of X-ray Spectra," with R.Y. Li, Rev. Sci. InstrumJ^, pp. 2195-2200 (1993).
130. "Synthesis of X-ray Intensity Profiles for X-ray Optical Systems with Curved Diffractors," with W.Z. Chang, J. Appl. Phys._74, pp. 2999-3008 (1993).
131. "X-ray Optics of Diffractors Curved to a Logarithmic Spiral," with W.Z. Chang and R.Y. Li, J. Appl. Phys._74, pp. 1534- 1540 (1993).
*132. "New Developments in Curved Diffractor Geometries for X-ray Microanalysis," with W.Z. Chang and R.Y. Li, Microbeam Analysis_2, S192-S193 (1993).
*133. "New Developments in Hardware for Microbeam Analysis," Microbeam Analysis 2, S8 (1993).
134. "Remote Alignment and Control System Based on Radio-controlled Servos," with W.Z. Chang, Rev. Sci. lnstrum._£4, 3034-3035 (1993).
135. "Calculation of X-ray Fluorescence Intensities for Convergent X-ray Beams," with W.Z. Chang, Microbeam Analysis .3., 23-32 (1994).
136. "Cathodoluminescence Study of Domains, Defects and Diffusion in ZnSe/GaAs (100)," with H.T. Lin and D.H. Rich, J. Appl. Physics^TS 8080-4 (1994).
*137. "Progress in the Theory, Fabrication and Characterization of Curved X-Ray Diffractors," Microbeam Analysis - Proc. 28th Annual MAS Meeting, 1994, pp. 26-27
138. "Calculation of Properties of a Misaligned Logarithmic Spiral Diffractor," with R.Y. Li, Microbeam Analysis - Proc. 28th Annual MAS Meeting, 1994, pp. 32-33.
139. "Fabrication and Diffraction Properties of a Crystal Bent to a Logarithmic Spiral," with Z.W. Chen and R. Grimm, Microbeam Analysis-Proc. 28th Annual MAS Meeting, 1994, pp. 30-31.
140. "Fabrication and Diffraction Properties of a Crystal Bent to a Logarithmic Spiral," with Z.W. Chen and R. Grimm, Microbeam Analysis^, 41-46 (1995).
141. "X-Ray Excited Luminescence as a Materials Characterization Technique," Microbeam Analysis -- Proc., 29th Annual MAS Meeting, 1995, pp. 171-172.
142. "Recent Developments in Curved Diffractors for Focusing X-Rays," Microbeam Analysis -- Proc., 29th Annual MAS Meeting, 1995, pp. 441-442.
143. "Wavelength Dispersive Spectrometer for JEOL 100CX TEM," with Z.W. Chen, Microbeam Analysis -- Proc., 29th Annual MAS Meeting, 1995, pp. 445-446. David B. Wittrv
144. "X-Ray Fluorescence Intensities from Thin Specimens for Convergent Beams," with
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